Introduction of news, developments and applications of different type of sputtering target materials
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Sputter targets introduction
sputtering targets, manufacture, PVD,
Magnetron sputtering coating is a new physical vapor deposition method, which uses an electron gun system to emit electrons and focus on the material to be deposited, so that the atoms sputtered out follow the momentum conversion principle and fly away from the material with high kinetic energy to form films. This material is called sputtering target

Sputtering is the preparation of thin film materials One of the main technologies is to use the ions produced by ion source to accelerate the aggregation in vacuum to form an ion beam with high speed energy to bombard the solid surface. The kinetic energy exchange occurs between the ions and the atoms on the solid surface, so that the atoms on the solid surface leave the solid and deposit on the substrate surface.
The bombarded solid is the raw material for depositing thin films by sputtering method, which is called the sputtering target. (Here is a great blog for more information about this physical vapor deposition tehcnique)Various types of sputtered thin films have been widely used in semiconductor integrated circuits, recording media, planar display and surface coating of workpieces. The high temperature and high vacuum environment inside the process reaction chamber can make these metal atoms form grains, and then through the micro image patterning and etching, the final layer of metal wires, and the chip data transmission depend on these metal wires.

There are multiple typles of techniques to make sputter tarigets. For metal sputter targets, induction melting is the most popular method to make them. However, for some metals with high melting point and ceramic targets, hot pressing is applied. In this case, the powder form raw material is packed in a mold and sintered in high temerature with high pressure. Check here to learn more information about hot pressing method in sputter target producing.

Sputtering targets are mainly used in electronic and information industries, such as integrated circuit, information storage, liquid crystal display, laser memory, electronic controller, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high-temperature corrosion resistance, high-grade decorative products and other industries. Check for more information about sputter targets material.

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